TSMC is going to present its recent developments in hardmask for deep implants in small pixel sensors at NMDC, Taiwan on Oct 6-9, 2013. The paper is titled "Nanotechnology Development for CMOS Image Sensor Applications" by C.C. Wang, T.H. Hsu, S.F. Ting, C.Y. Chen, K.C. Huang, J.C. Liu, S. G. Wuu. TSMC has developed a nice hardmask process for pixel size of order of 1um:
TSMC Develops Hardmask for Deep Implants
Reviewed by MCH
on
September 24, 2013
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Reviewed by MCH
on
September 24, 2013
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